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Room 309 High-power Impulse Magnetron Sputtering (HiPIMS) (高功率脉冲磁控溅射技术)
Invited speakers in High-power Impulse Magnetron Sputtering, HiPIMS symposium: 
Dr. Mike Hopkins [Ireland] Chief Executive Officer Impedans Ltd., Presentation title: Plasma Diagnostics in HiPIMS 
Prof. Xiubo Tian [China] State Key Laboratory of Advanced Welding and Joining Harbin Institute of Technology Presentation title: High power impulse magnetron sputtering based on novel waveform configuration Prof. Qiang Chen [China] Beijing Institute of Graphic Communication Presentation title: Semi-Condutivity ZnO film Prepared by HiPIMS Dr. Ivan Fernandez-Martinez [Spain] Nano4Energy SL Presentation title: Industrial use of HiPIMS with voltage reversal: high deposition rate of metal nitrides 13 September 2018 High-power Impulse Magnetron Sputtering (HiPIMS) Room 309 Chairs：Yuan Xia, China Liuhe Li,Mike Hopkins Time Title 08:15-08:35
☆ High Power Impulse Magnetron Sputtering Based On Novel Waveform Configuration Xiubo Tian Harbin Institute of Technology, China 08:35-08:55
☆ Plasma Diagnostics in HiPIMS Mike Hopkins Impedans Ltd., Ireland 08:55-09:10
Discharge characteristics of superimposedHiPIMS-MF and properties of as-prepared Nitride nanocomposite coatings Deen Sun Chongqing University, China 09:10-09:25
Gas breakdown and discharge formation in high power impulse magnetron sputtering Peiling Ke Ningbo Institute of Materials Technology and Engineering, CAS, China 09:25-09:40
Hipimsindustrializationunderhighionization applications Jialei Chen TRUMPF Huttinger, Germany 09:40-09:55
Mass spectrometry diagnostics of the ion energy and ion flux during bipolar pulsed high power impulse magnetron sputteringof titanium nitride Jiabin Gu Linköping university, Sweden Beihang University, China 09:55-10:10
Discharge and deposition of HiPIMS basedon cylindrical-shape cathode Zhongzhen Wu Peking University Shenzhen Graduate School, China 10:10-10:20 Tea Break 10:20-10:40
☆ Semi-Condutivity ZnO film Prepared by HiPIMS Qiang Chen Beijing Institute of Graphic Communication, China 10:40-11:00
☆ Industrial use of HiPIMS with voltage reversal: high deposition rate of metalnitrides Ivan Fernandez-Martinez Nano4Energy SL, Spain 11:00-11:15
The construction of aminated diamond-likecarbon coating onto polyetheretherketone with better osseointegration Huaiyu Wang Shenzhen Institutes of Advanced Technology, CAS, China 11:15-11:30
Effects of HiPIMS pulse-length on plasma discharge and on the properties of WC- DLC coatings Lei Wang Beihang University, China 11:30-11:45
Study on the thermal stability of the Zr-B- O-N coatings fabricated by hybrid coatingsystem Tiegang Wang Tianjin University of Technology and Education, China 11:45-12:00
Compositiondependedionextraction characteristics of cylindrical-shape cathodeassisted by the electromagnetic attractor Suihan Cui Peking University Shenzhen Graduate School, China 2018年9月13日 大功率脉冲磁控溅射（HiPIMS） 309室 主持人：袁霞，中国六合理，迈克霍普金斯 时间 标题 08：15-08：35 ☆ 基于新型波形配置的高功率脉冲磁控溅射 秀博田 哈尔滨工业大学，中国 08：35-08：55 ☆ HiPIMS中的等离子诊断 迈克霍普金斯 Impedans Ltd.，爱尔兰 08：55-09：10 叠加HiPIMS-MF的放电特性和制备的氮化物纳米复合涂层的性能 Deen Sun 中国重庆大学 09：10-09：25 高功率脉冲磁控溅射中的气体击穿和放电形成 Peiling Ke 中国科学院宁波材料技术与工程研究所 09：25-09：40 Hipims 在高电离应用下的工业化 陈佳蕾 TRUMPF Huttinger，德国 09：40-09：55 双极脉冲高功率脉冲磁控溅射氮化钛时离子能量和离子流的质谱诊断 顾嘉宾 瑞典林雪平大学，中国 09：55-10：10 基于圆柱形阴极的HiPIMS的放电和沉积 吴忠真 北京大学深圳研究生院，中国 10：10-10：20 茶歇 10：20-10：40 ☆ 半导体ZnO薄膜由HiPIMS制备 陈强 中国北京印刷学院 10：40-11：00 ☆ 具有电压反转的HiPIMS的工业用途：金属氮化物的高沉积速率 Ivan Fernandez-Martinez Nano4Energy SL，西班牙 11：00-11：15 在聚醚醚酮上构建胺化类金刚石碳涂层，具有更好的骨整合作用 王怀宇 中国科学院深圳先进技术研究院 11：15-11：30 HiPIMS脉冲长度对等离子体放电和WC-性能的影响 DLC涂层 王磊 中国北京航空航天大学 11：30-11：45 混杂涂层体系制备Zr-B-ON涂层的热稳定性研究 王铁刚 天津工业大学，中国 11：45-12：00 组成依赖于电磁吸引子辅助的圆柱形阴极的离子提取特性 崔隋汉 北京大学深圳研究生院，中国 http://www.25ifhtse.org/dct/page/70045 |
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